October 08, 2004Printer Friendly Version

Engineering graduate student seminar

At a glance:
JOINING DIP-PEN NANOLITHOGRAPHY AND MICROCONTACT PRINTING INTO A NANOLITHOGRAPHIC PROCESS

One nanomanufacturing concern is the precise, controlled alteration of materials at the nanoscale, commonly referred to as nanolithography. One promising technique, dip-pen nanolithography (DPN), can deposit a multitude of organic and inorganic materials. Simple and accurate, DPN uses an atomic force microscope (AFM) cantilever to deposit chemical inks under ambient conditions. However, from a manufacturing perspective, DPN’s main drawback is its inherent serial nature. Another promising technique is microcontact printing (µCP), which can repeatedly cover larger areas in a parallel fashion. As interest in nanomanufacturing processes increases, the demand for user-friendly, automated nanolithographic processes become a priority. The research focuses on creating a nanolithographic process that begins with a design plan and ends with a finished sample using a unique progression from design environment to serial nanolithographic technique to parallel nanolithographic technique.
Contact Information

Browse our archives:
Contact Information

Alexei Valiaev

CIERD Co-Chair for Communications
CIEMAS 3384
Phone: (919) 660-5472
Fax: (919) 660-8963
[e-mail address]